The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
EUV lithography is considered as a possible technology for the mass production of devices at the 32nm technology node and beyond. One special characteristic of EUV masks is its composition (Mo/Si multilayer, absorbing layer, etc.) which is totally different for the conventional photomask. This has to be considered explicitly in the simulation of electron-beam energy dissipation calculation (EDF(r))...