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This work is motivated by the issues caused by the airborne molecular contamination (AMC) in the semiconductor industry and their control needs in EUVL and the current photolithography. In order to tackle the problem, sorption mathematical models have been investigated and validated using a quartz crystal microbalance (QCM). This technique, which confers a high sensitivity (ng level), allows the study...
Airborne molecular contamination (AMC) is responsible for crystalline defects and has an impact on final yield for 300 mm CMOS sub 90nm technology. In this paper, we describe our investigation on a vacuum purge system designed to suppress post etch issues. Moisture and volatile acids released in slot-to-slot space inside FOUP during queue time were found to be essential elements for crystal growth...
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