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The Ti-doped ZnO films were deposited onto Corning 7059 glass substrates using a magnetron co-sputtering process in a mixture of oxygen and argon gases. The experimental results show that the deposition rate increases approximately linearly with Ti target powers (DC) when lower than 300 W powers of them were applied. Only the (002) X-ray diffraction 2θ peak appears in the range of study. The incorporation...