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Novel electron-optical components and concepts aiming at improving the throughput and extending the applications of a low energy electron microscope (LEEM) have been developed. An immersion magnetic objective lens can substantially reduce e–e interactions and the associated blur, as electrons do not form a sharp crossover in the back-focal plane. The resulting limited field of view of the immersion...
In a raster scan lithography system, it is possible to correct proximity effects while the pattern is being exposed. This technique will be called run-time proximity correction. It is quite different from conventional methods that preprocess pattern data before exposure. It is a user transparent part of an exposure strategy whose throughput does not depend on the density, complexity, or randomness...
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