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A simple method is described to protect polycrystalline silicon (polysilicon) from electrochemical corrosion which often happens when the Micro-Electro-Mechanical systems (MEMS) device is released in HF-based solutions, especially when the device contains noble metal. We propose to employ a photoresist (PR) layer to cover the noble metal layer, which electrically contacts with the underlying polysilicon...
Wafer-scaled cost-effective technique for subwavelength structured (SWS) surface by means of anodic porous alumina masks directly formed on SiO2/Si substrates is demonstrated. Combined with ion beam etching and induced coupled plasma etching, SWS surface with a period of 100nm and a height of 200-300nm was achieved on 2 inch polished single crystalline Si wafer. A lower reflectivity below 6% was observed...
UV laser excited microphotoluminescence (PL) was used to evaluate the local strain for freestanding Si membranes (FSSMs), which can be applied to the fabrication of high performance radiofrequency (RF) power amplifier. The FSSMs were fabricated by the mesa etching of Si on insulator followed by etching of the buried oxide. Compressive strain in the membranes was induced by SiN deposition using low-pressure...
Surface-normal optical filters are reported based on Fano resonances in patterned single crystalline silicon nanomembranes (SiNM), which were fabricated and transferred onto transparent glass substrates using a disruptive wet transfer process. The measured filter transmission results agree well with the design using a three-dimensional finite-difference time-domain technique. Using the SiNM wet transfer...
In this work, we analyzed electrical properties of Si nanocrystals (NCs) using scanning capacitance microscopy (SCM). Charging, discharging effects of a NC with respect to the various temperatures were characterized through the capacitance spectroscopy and SCM images.
In this paper is presented for the first time an accurate, physically based simulator for boron, arsenic, and phosphorus ion implantation covering a very wide range of energies from a few keV to several MeV. This wide range of energies, as well as on-axis and off-axis implantations, is covered by a single, comprehensive model. Combined with previously developed models for damage accumulation, this...
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