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Thin copper-doped aluminum oxide (Cu-doped-AlOx) and AlOx films of about 5nm thick were generated by oxidizing the surfaces of Al and Al-5wt.% Cu (Al-Cu) films in an oxygen plasma. According to X-ray photoelectron spectroscopy analyses, these two oxide films were found to be deficient in oxygen and had gradient concentrations of Al and O. The oxide films were employed as resistor layers sandwiched...