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Microwave assisted reactive sputtering was applied to obtain homogeneous and high optical quality ITO thin films with thickness of 50, 100, 200 and 280 nm. Electrical properties of deposited ITO thin films were measured using standard four-point probe method together with transmission spectra of ITO thin films in the wavelength range from 330 nm to 880 nm. The figure of merit calculated for all samples...
In this work thermoelectrical properties of TiO2:(Co, Pd) and TiO2:Nb thin films have been described. Thin films were performed by high energy magnetron sputtering method. Sputtering process was carried out from mosaic targets under low pressure of oxygen reactive gas. Electrical and thermoelectrical properties of as deposited and annealed at 800 K thin films were analyzed based on resistivity and...
Transparent conducting indium-tin oxide (ITO) thin films play a very important role in the field of optoelectronic devices such as photovoltaic cells and flat panel display devices. ITO films display low electrical resistance and high transmittance in the visible range of the optical spectrum. ITO thin films were deposited using a magnetron sputtering with a microwave source to improve the plasma...
In this paper new magnetron sputtering system for multilayers deposition has been presented. The system allows sputtering of different materials from 4 targets in low pressure of working and reactive gas (oxygen, argon, oxygen + argon). Manufactured structures can be build from films, which have gradient concentration of dopant. Also the doping process can be performed with high precision in continuous...
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