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EUV Technology continues to make slow progress due to power source constraints. This extension will force customers to use 193 nm technology to bridge the gap until EUV can be fully utilized. As 193 nm technology are being used in smaller and smaller technology nodes, customers are imposing more and more stringent contamination requirements on the reticle environment to protect reticles from haze...
A novel enhanced dual-percolation technique has been developed to facilely create conductive porous nanocomposite at an ultra low carbon black (CB) concentration. The percolation threshold of obtained material decreases nearly ten times compared with that of as-mixed composite. Moreover, a significant enhancement in conductivity can be achieved for such porous composite. Compared with the conventional...
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