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Advancements in process technology have resulted in tremendous increase in the number of design rules. This has greatly complicated the task of building design rule clean layouts. While EDA tools aid in layout creation for standard cell based ASICs, the problem remains unsolved for custom, analog and RF circuits. For such circuits, layout designers spend lot of time converting functionally correct...
Sub-wavelength lithography in modern fabrication processes has resulted in a tremendous increase in the number of design rules. Of these, the context dependent design rules are especially hard to adhere to during manual layout creation. Layout legalization or automatic correction of design rule violation, therefore, has attained prime importance. Layout legalization can be modeled as a modified layout...
Layout migration is an important step in design reuse. This paper presents a cell swapping based methodology to migrate hierarchical layouts from one technology to another. The migrated layouts retain both layout hierarchy and swapped cell sanctity. The proposed methodology swaps cell instances, marks these instances as fixed, builds broken connectivity due to cell swapping, and then uses a variant...
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