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A novel fabrication method of tilted microlens array for light control films is developed to increase the efficiency of a liquid crystal display that can collect lateral light sources and improve the dazzling problem within the angle of view. Initially, the pattern allows UV exposure by placing a photoresist-coated substrate on an inclined fixture. An inclined photoresist column array is made with...
This paper outlines a novel technique for using suspended photoresist above holes and trenches as planar bridge layer in the fabrication of through silicon vias (TSVs) and beams. Photoresist film is formed through self-assembly on water surface and then transferred to a wafer as planar bridge layer to cover previously fabricated holes and trenches, which can be patterned with photolithography. The...
A reliable low-cost method is developed to batch fabricate Micro-Electro-Mechanical Systems (MEMS) resonators with high yield. The key breakthrough in the fabrication process is one novel approach realized to effectively restrain electrochemical corrosion of polycrystalline silicon (polysilicon) electrically coupled with noble metals of MEMS devices by hydrofluoric acid (HF)-based solutions. In addition,...
Wafer-scaled cost-effective technique for subwavelength structured (SWS) surface by means of anodic porous alumina masks directly formed on SiO2/Si substrates is demonstrated. Combined with ion beam etching and induced coupled plasma etching, SWS surface with a period of 100nm and a height of 200-300nm was achieved on 2 inch polished single crystalline Si wafer. A lower reflectivity below 6% was observed...
22nm node Si SOI Coplanar “N Channel Vertical Dual Carrier Field Effect Transistors” (VDCFET) and its SOC with effective channel length less than 10nm for communication applications are presented.
A simple and effective method to fabricate a high fill-factor triangular microlens array using the proximity printing in lithography process is reported. The technology utilizes the UV proximity printing by controlling a printing gap between the mask and substrate. The designed approximate triangle microlens array pattern can be fabricated the high fill-factor triangular microlens array in photoresist...
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