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X-ray photoelectron spectroscopy (XPS) data indicate that organosilicate glass (OSG) films with backbone carbon (Si-R-Si) exhibit significantly enhanced resistance to carbon loss upon exposure to either atomic oxygen (O(3P)) or to vacuum ultraviolet light in the presence of O2 (VUV+O2)—important factors in O2 plasma environments—compared to films with terminal methyl groups (Si-CH3). These results...
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