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Ammonia (NH3) as a precursor for epitaxial nitride films is required to be free of trace oxygenated impurities, such as CO2, that have been shown to negatively affect growth processes and device performance. Carbon dioxide can react reversibly with the NH3 gas to form ammonium carbamate, NH4COONH2 (a solid with low solubility in liquid NH3) and, therefore, can be present in cylinder sources both in...