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In sub 10-nm technology nodes, the directed self-assembly technology with multiple patterning lithography (DSA-MP) is a promising solution for contact/via layer fabrication. However, previous studies using multiple patterning with a single block copolymer (BCP) material still suffer from low via manufacturability due to limited types of feasible guiding templates. To mitigate the problem, multiple...
Because of the delay of the next-generation lithography technologies, self-aligned double patterning (SADP) has become one of the major lithography solutions for sub-20-nm technology nodes. For advanced sub-10-nm nodes, self-aligned quadruple patterning (SAQP) or even self-aligned octuple patterning will be required. Due to considerable design complexity and unmanageable process variation, 1-D grid-based...
This study presents a novel two inputs and five outputs universal current-mode biquadratic filter. The structure employs three inverting second-generation current conveyors (ICCIIs), three grounded resistors and two grounded capacitors, which can realize lowpass, bandpass, highpass, bandreject, and allpass filtering responses from the same topology. The proposed circuit maintains the following advantages:...
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