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In this work, gate-all-around (GAA) poly-Si nano wire (NW) thin film transistors (TFTs) with record physical gate length of 30 nm and driving current >100 μA/μm are demonstrated. The cross section of the NW channel is as small as 35 nm × 8 nm. The tight GAA and NW structure enhances the gate potential control ability effectively, therefore, excellent short channel and narrow width behaviors can...
A novel 30-nm gate-all-around (GAA) polycrystalline-silicon (poly-Si) nanowire (NW) thin-film transistor (TFT) is reported for the first time. Owing to the NW and GAA structure, the channel electric potential is well controlled by the gate electrode. After NH3 plasma treatment for defects passivation, the values of 0.97 V, 224 mV/dec, and 0.895 V/V of threshold voltage, subthreshold swing, and drain-induced...
Thin active layer, fully-silicided source/drain (S/D), modified Schottky barrier, high dielectric constant (high-k) gate dielectric, and metal gate technologies are integrated to realize high performance TFTs. Devices with 0.1 mum channel length were fabricated successfully. Low threshold voltage, low subthreshold swing, high effective mobility, low S/D resistance, high on/off current ratio, and good...
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