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The goal of this work is to study parameters related to the analog performance of tunnel field effect transistors (TFETs). The obtained results have been analyzed in terms of temperature variation (ranging from 25°C to 150°C) and source composition (Sh-xGex and 100% Si). The first part is focused on characteristic curves of the drain current as a function of gate voltage and drain voltage. Next step...
The analog performance of hetero-junction vertical NanoWire Tunnel FETs (NW-TFETs) with different Ge source compositions (27% and 46%) is studied and compared to Si source devices. Although the NW-TFETs with the highest amount of Ge at the source present the highest transconductance (lower bandgap and higher BTBT predominance), the NW-TFETs with 27% Ge source present a better intrinsic voltage gain...
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