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The principal challenge for creating vacuum electron devices in the millimeter-wave (mmW) frequency range is accurate fabrication of slow-wave circuits and other electromagnetic features with tight tolerance. Ultraviolet Photolithography and Electroforming (UV-LIGA) techniques are presented that allow tight tolerance control for slow wave circuits for the mmW and sub-mmW bands. We show how these techniques...
The design, fabrication, and electromagnetic cold testing results of an all-copper grating circuit intended for a G-band sheet-beam traveling-wave amplifier are presented. Fabrication was carried out via ultraviolet photolithography (UV-LIGA) using the SU-8 photoresists. Two cold test methods used to characterize the microfabricated circuits are reported and reveal excellent agreement with simulations...
A 50 watt, wideband serpentine amplifier is under development to demonstrate a novel beam tunnel fabrication technique capable of forming arbitrarily long beam tunnels of very small diameter using a single Ultraviolet Lithography (UV-LIGA) exposure step.
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