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In this paper, we study on Overlay (OVL) control method for inline OVL measurement. In semi conduct manufacturing industry, Lithography (Litho) OVL is defined as the positional accuracy, a criteria parameter and to detect possible inline nonconformance from recipe and equipment shifts [1]. Generally, most control limit setting are based on the engineering judgment, tolerance about 1/3 critical dimension,...
In ISO/TS16949 international standard, process audit is a mandatory system requirement, to confirm the effectiveness of the manufacturing process. But the standard doesn't clearly indicate the specific sampling size. The sampling quantity is often judged by personal experience during the audit, which may lead to discrepancy when choosing the sampling size, which further leading to audit result difference...
In this paper, we introduce a data comparison method, Matching Rule (MR). By setting up a relation between MR and F/T, an empirical criterion of MR for comparing two groups of data is defined. It is based on a study on the classical statistic method “Hypothesis test — F/T”. The F/T test is widely used to compare variations & means of two normal populations. However, the empirical criteria of MR...
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