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The challenging fabrication of sub-100-nm structures with high aspect ratio by UV-nanoimprint lithography (NIL) is addressed in this work. Thermal shrinkage is induced by cooling the structures below room temperature to avoid the issues commonly arising during the release of the polymeric nanostructures from the master. The UV-NIL has been performed to obtain OrmoComp® nanostructures using OrmoStamp...
Moirés have been increasingly applied to create novel security features typically implemented by means of printing techniques, which achieve a resolution up to 2000 dpi. However, this resolution is not sufficient to effectively prevent counterfeits by desktop scanners and printers. In this paper we propose and demonstrate the design and cost-efficient fabrication of moiré-based security features with...
This paper presents the design, fabrication and characterization of all-optical polymer-based Micro-optoelectromechanical system (MOEMS) Variable Optical Attenuator (VOA). It consists of an SU-8 quad-beam structure and a suspended waveguide aligned to input/output fiber optics. Actuation is achieved by defining dye-doped SU-8 structures on the mechanical beams. Specific wavelengths focused on such...
We report the first experimental realization of an analogous of the Stimulated Raman Adiabatic Passage (STIRAP) technique [1] working as a light spectral filter [2,3]. The system consists of three identical coupled total internal reflection silicon oxide waveguides designed such that there is a counterintuitive variation of the evanescent couplings between the waveguides along the propagation direction...
The fabrication of precise hemispherical shape is challenging with standard planar lithography techniques. A suitable alternative is the fabrication by inkjet printing. This paper presents a method based on drop-on-demand inkjet printing on pre-patterned silicon substrates allowing the controlled fabrication of SU-8 hemispherical cup-like structures with inner cavities of sub-nano-liter volumes. Examples...
This paper reports the implementation of magnetic variable optical attenuators (M-VOA) by soft lithography (SLT) and using polydimethylsiloxane (PDMS) as constituent material. Two different fabrication protocols are used and compared. In the first case, a two-layer structure containing a clean PDMS layer on a magnetic PDMS (M-PDMS) layer is fabricated by SLT. M-PDMS is obtained by doping clean PDMS...
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