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A prognostic circuit for electromigration failure of integrated circuit was proposed, and it was simulated on the base of the SMIC 0.18 um mixed-signal CMOS process model. The prognostic circuit is composed of stress and detection module, two-stage comparator, offset voltage cancellation module, non-overlapping clock generation module, and output module. When the increase amount of resistance for...
Both Al interconnects and flip-chip solder bumps were sensitive to high current. The failure mechanism of circuits interconnects would be more complicated if the current density in circuits was exceed the critical magnitudes of electromigration in both Al interconnects and solder bumps. The failure of circuit interconnects under different magnitudes of current density was studied and the interaction...
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