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Enterprise application integration (EAI) is one of the most current topics in information technology today. Applying Service Oriented Architecture (SOA) is a fair headway in EAI, but involving the productive enterprise systems (ES) into such integration scenarios still raises a lot of open issues: the data representation probably differs in participating ESs, which indicates the need for detection...
Supporting the everyday management and working processes of an organization is hard to imagine without software systems today. Enterprise resource planning (ERP), customer relationship management (CRM), computer aided engineering (CAE), computer aided design (CAD), etc. systems can be found everywhere in working processes of organizations. Although these systems provide a lot of information they aren't...
Process planning and control has a key role at building a proper manufacturing both in theoretical and practical manner. Quality and effectiveness of completing end-user requirements depend on process control and quality assurance which is mostly supported by computer aided systems. However complex software solutions supporting manufacturing, process control and quality assurance are often placed...
The last 20 years have seen a lot of changes in the life of organizations. The always strong competition to be on the edge increased due to the saturation of the consumer markets. The new way to improve everyday working is computer-based information systems, which have become essential for survival in the last couple of years. This paper presents the short history of ERP systems first. From computer...
CN x layers were grown on polished Si(100) wafers by reactive DC magnetron sputtering of a high purity graphite target by nitrogen ions. The deposited layers were characterized by XPS and FT-IR spectroscopy. The 'as-prepared' CN x layers contained approximately 20-40 at.% nitrogen measured by XPS. The large width and asymmetric shape of the C1s and N1s lines manifested several chemical...
A DC planar magnetron discharge is characterised by Langmuir probe measurements. Electron temperature (T e ), floating potential (U f ) and plasma potential (U p ) have been measured in argon and argon-nitrogen discharges above titanium and copper targets as a function of pressure, discharge current, and target-to-probe distance. The plasma potential and the floating potential...
A qualitative reaction kinetics model is described for reactive magnetron deposition of TiN. According to the model the compound formation on the film surface is driven by the rate of nitrogen ions coming from the plasma. The plasma of a DC planar magnetron sputtering source has been investigated with a single Langmuir probe above the target at discharge currents of 0.5 A and 1 A, and pressures of...
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