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Wafer/pad temperatures are measured for various elastomer materials for control of wafer temperatures during high-power implantation to less than 40 C. Wafer/pad temperatures during and directly following implant are monitored by in-situ IR sensors and tracked over long operational cycles. Beneficial effects of wafer temperature control is noted for gain characteristics of modern IC devices.
It has been over 16 years since Cisco's NetFlow was patented in 1996. Extensive research has been conducted since then and many applications have been developed. In this survey, we have reviewed an extensive number of studies with emphasis on network flow applications. First, we provide a brief introduction to sFlow, NetFlow and network traffic analysis. Then, we review the state of the art in the...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.