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This paper presents various methods of multi-beam laser interference lithography to form dense periodical nanostructures suitable for many optical functional materials or devices. Research results show that 2D and 3D inference patterns could be generated cheaply and easily by exposing the photosensitive materials using the periodically changed light intensity distributions of multi-beam interference...
This paper presents a method of phase-shift control in two-beam laser interference lithography. In the method, a PZT actuator is used to push a mirror and introduce phase shifts in a He-Ne laser interference lithography simulation system. When different voltages are applied to the PZT actuator, fringe positions are changed accordingly, and the phase shifts are introduced. The phase shifts can be determined...
This paper introduces a method for the determination of the slope and period of oblique and equi-spaced fringes by pattern correlation. In the method, two pairs of image patches in two different regions of a fringe pattern are selected for pattern correlation calculations, and the phase shift between the two selected regions of the fringe pattern is obtained from the phase curves computed with the...
This paper introduces the quality inspection of nanoscale patterns produced by the Laser Interference Lithography (LIL) technology using image analysis techniques. In this paper, patterns of two-beam and four-beam interferences are considered. Image analysis techniques based on the Hough transform (HT) and Maximum Likelihood Estimation (MLE) have been applied to detect and estimate various quality...
Four-beam laser interference lithography (LIL) was shown to be a good technology to generate graded-index photonic crystals with a square lattice. Characters of the structure vary regularly with the incident angles and relative thresholds. The finite-difference time-domain method was used to validate the focusing behavior of the resultant structure. High intensity enhancement and sub-wavelength focusing...
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