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Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have...
This paper presents various methods of multi-beam laser interference lithography to form dense periodical nanostructures suitable for many optical functional materials or devices. Research results show that 2D and 3D inference patterns could be generated cheaply and easily by exposing the photosensitive materials using the periodically changed light intensity distributions of multi-beam interference...
This paper according to the problems of weak echo signal in the optical system of laser fuze. By analyzing the factors of measuring distance, combined with the specific requirements of laser fuze, according to aspheric optical design theory, using Optical Software of ZEMAX. Design single receive focusing lens of laser fuze. Simulation results show that the echo signal can be efficiently brought together...
This paper investigates the problems of the large beam divergence angle and short detection range in the launch system of laser proximity fuze. By analyzing the factors of measuring distance in laser proximity fuze, combined with characteristics of laser's far-field divergence angle, and according to aspheric optical design theory, we carry out image processing and simulation of laser spot by using...
This paper introduces a method for the determination of the slope and period of oblique and equi-spaced fringes by pattern correlation. In the method, two pairs of image patches in two different regions of a fringe pattern are selected for pattern correlation calculations, and the phase shift between the two selected regions of the fringe pattern is obtained from the phase curves computed with the...
This paper introduces the quality inspection of nanoscale patterns produced by the Laser Interference Lithography (LIL) technology using image analysis techniques. In this paper, patterns of two-beam and four-beam interferences are considered. Image analysis techniques based on the Hough transform (HT) and Maximum Likelihood Estimation (MLE) have been applied to detect and estimate various quality...
Four-beam laser interference lithography (LIL) was shown to be a good technology to generate graded-index photonic crystals with a square lattice. Characters of the structure vary regularly with the incident angles and relative thresholds. The finite-difference time-domain method was used to validate the focusing behavior of the resultant structure. High intensity enhancement and sub-wavelength focusing...
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