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We have demonstrated 1200V and 3300V planar 4H-SiC MOSFET technology at our 6-inch foundry. 1200V MOSFETs demonstrate good avalanche ruggedness under single-and one million (1,000,000) repetitive unclamped inductive switching (UIS) pulse tests. 1200V MOSFETs can pass one hundred (100) 10 microsecond short-circuit events at 600V bus voltage, while 3300V MOSFETs can pass 5 microsecond short-circuit...
Ge MOS capacitors with tri-layer gate dielectric are proposed by using GeON interlayer, TaON sandwich layer, and HfTiON high-k dielectric. Very small capacitance equivalent thickness (0.79~0.91 nm) is achieved. Experimental results show that the NO pretreated sample exhibits the best electrical properties, such as low interface-state density (5.4 × 1011 cm-2 eV-1), low gate leakage current density...
In this paper, Si-MOS capacitors with HfTiO/SiON stack gate dielectric were fabricated by using Si-surface thermal passivation in NO and N2O ambients respectively and reactive co-sputtering technology. Results show that the sample pretreated in NO ambient has excellent interface properties, low gate leakage current density and high reliability. This is attributed to the formation of a SiON interlayer...
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