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We demonstrate modulated H2 and O2 plasma treatments as an effective methodology for controlled chemical functionalization by hydrogen and oxygen atoms of single- and multi-layer chemical vapor deposition (CVD) graphene aiming at engineering material properties. The effects of the functionalization degree on the optical and transport properties of graphene are discussed with a twofold aim of (i) providing...
The structural, morphological and optical properties of ZnO thin films grown by metal organic chemical vapor deposition (MOCVD) also plasma-assisted (PA-MOCVD) and Au-catalyst assisted (Au-MOCVD) are investigated. A new precursor Zn(TTA) 2 TMED (HTTA=2-thenoyltrifluoroacetone, TMED=N,N,N′,N′-tetramethylethylendiamine) and O 2 have been used to grow film on various substrates, including...
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