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TiN thin films were deposited by reactive gas pulse (RGP) sputtering approach as a function of the amplitude Γ and the velocity v of N2 gas injection. Hybrid architecture of compositionally graded and multilayered structures in the RGP-TiN films was observed in a wide window of N2 gas injection parameters. This hybrid structure consisted of Ti-phase and TiN-phase sublayers, where the former sublayer...