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Two-dimensional (2D) dose control is becoming well accepted for semiconductor device fabrication. At the same time, two specialized versions are arising; (1) High accuracy intentional non-uniform dose implant with relatively moderate dynamic dose range and (2) High dynamic dose range intentional non-uniform implant with relatively moderate dose accuracy. Sumitomo Heavy Industries Ion Technology (SMIT)...
Needless to say, productivity of ion implantation processes is a very important issue for economical device fabrication. Reduction of implant areas is one of the essential keys to increase a beam utilization factor for high-current ion implanters. SEN already developed the X-, Y-, D-, and F-SAVING system to address this issue. This time, another SAVING system, the O-SAVING, has been developed for...
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