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Fabricating precise freestanding metal membranes tens of nanometers thick in a continuous stack with a constant air gap of several microns is a key challenge in a free-electron extreme ultraviolet (EUV) source design program. Such a stack, when exposed to a high energy (∼9MeV) electron beam, will operate as an EUV light emitting device.A novel MEMS-based microfabrication technique enables manufacturing...