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The role of tantalum nitride (TaNx) thin films as buffer layers on the control of nucleation and growth of aligned carpet-like carbon nanotubes (CNTs) has been proved. TaNx thin films have been deposited on Si by controlled magnetron sputtering process. Multiwall CNTs have been synthesized at 850°C using an aerosol of ferrocene diluted in toluene. Electron microscopy images show a strong correlation...
The diameter of carbon nanotubes deposited on TaN coated silicon substrates by catalytic chemical vapor deposition strongly depends on the N/Ta ratio in the coating. The coating characteristics are tailored by controlling the deposition parameters in a plasma reactive sputtering process. Photoelectron emission spectroscopy and X-ray diffraction of the coatings show the formation of a composite material...
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