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To what extent two, four or eight Langmuir-Blodgett films of omega-tricosenoic acid (CH 2 (CH 2 ) 20 COOH) deposited on a silicon wafer will retard the thermally induced reaction of a superimposed nickel film with the silicon substrate is investigated using MeV He backscattering spectrometry as an analytical tool to detect the presence or absence of a reaction in the range...