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This paper describes the creation of artificial neural network models using production line data and illustrates their usefulness for process control in semiconductor manufacturing. Three artificial neural network models are created. The first models a high aspect ratio etch process. The other two are created to predict yield metrics from inline critical dimension (CD) measurements. One model predicts...
The fabrication of integrated circuits involves many unit processes, some linear and some non-linear, and each with multiple inputs and outputs. These complexities suggest that benefits could be derived from the development and implementation of advanced process control tools and strategies. Empirical process models are one of these tools. In this research, sequential neural network models are developed...
The fabrication of integrated circuits involves many non-linear processes, each with several inputs and outputs. These complexities suggest that benefits could be derived from the development and implementation of advanced process control tools and strategies. Empirical process models are one of these tools. In this research, sequential neural network models were developed to characterize critical...
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