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Overcoming throughput challenges in current graphene defect healing processes, such as conventional thermal annealing, is crucial for realizing post‐silicon device fabrication. Herein, a new time‐ and energy‐efficient method for defect healing in graphene is reported, utilizing polymer‐assisted rapid thermal annealing (RTA). In this method, a nitrogen‐rich, polymeric “nanobandage” is coated directly...