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Tungsten trioxide coatings were grown on fluorine doped tin dioxide glass substrate at 465 oC by low pressure chemical vapor deposition. Monoclinic tungsten oxide with low crystallinity containing agglomeration of grains was obtained irrespective of the O2 flow rate utilized. It was only observed an increase of grain size to 75 from 25 nm as the O2 raised to 100 from 25 sccm. In addition, the current...