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We demonstrate key factors enabling mobility improvement at both low charge density and high density (>5 × 1012/cm2) in In0.7Ga0.3As quantum-well MOSFETs. We further show sub-threshold swing (SS) and on-current (Id) improvement in tunneling FETs (TFETs). By reducing EOT, optimizing the top-barrier/high-κ interface, and confining carriers in In0.7Ga0.3As channel using In0.52Al0.48As bottom-barrier,...
In this paper, a 200 nm n-channel inversion-type self-aligned In0.53Ga0.47As MOSFET with a Al2O3 gate oxide deposited by Atomic Layer Deposition (ALD) is demonstrated. Two ion implantation processes using silicon nitride side-wall are performed for the fabrication of the n-type source and drain regions. The 200 nm gate-length MOSFET with a gate oxide thickness of 8 nm features the transconductance...
We discuss monolithic integration of a 100-channel AWG with a 10-GHz channel spacing with 100 Michelson-interferometer-based phase- and amplitude-modulators. The AWG showed approximately 10 dB crosstalk, and the twin-integrated devices comprise a 2?? InP wafer.
This paper compares device performance for In0.53Ga0.47As MOSFETs using single HfO2 gate dielectric with stacked gate dielectrics using various interfacial layers between HfO2 and In0.53Ga0.47As substrate including Al2O3, HfAlOx, LaAlOx, and LaHfOx. Of the gate stacks studied, Al2O3/HfO2, HfAlOx/HfO2, and LaAlOx/HfO2 bilayer gate dielectrics exhibit lower subthreshold swing, higher drive current and...
InSbN photodiodes prepared by N+ and Mg+ implantation into InSb wafers for long wavelength infrared photodetection are demonstrated for the first time. The detection wavelength can be controlled by monitoring the implanted nitrogen. Such devices are capable of mid- and long-wavelength infrared photodetection and potential candidates for terahertz radiation.
The authors investigate the effect of intermixing in shallow InGaAs/GaAs quantum well structure using impurity free induced disordering (IFVD) technique. The degradation of the photoluminescence (PL) signal is due to the severe loss of As from the material during high temperature annealing at above intermixing activation energy. The recovery of the PL signal from the intermixed InGaAs/GaAs quantum-well...
The temperature dependant electrical properties of InSbN alloys fabricated by directly nitrogen ion implanted into InSb substrate are investigated using Hall effect measurement. Intrinsic behavior is observed in the high temperature range (180-300 K). Higher nitrogen doping level and annealing temperature will result in lower electron carrier concentration. Phonon scattering dominates.
We study the optical gain and alpha factor of InAs/InAlGaAs quantum-dash lasers on InP substrate after being subjected to the postgrowth intermixing process. The intermixing was achieved using dielectric capping process that involves the deposition of dielectric film and subsequent rapid thermal annealing. Compared to the un-intermixed laser, we found that the intermixed lasers with a 93 nm bandgap...
InSb1-xNx was grown epitaxially on InSb (100) by metal-organic chemical vapor deposition. The XRD measurement showed that the full width at half maximum (FWHM) of the sample is as low as 0.04, which indicates that the film behaves very high quality. Besides, lattice mismatch between InSb1-xNx layer and InSb substrate was also detected from the XRD results, indicating that the nitrogen has been successfully...
We report on the growth of InAs quantum-dash in InGaAlAs quantum-well structure on InP substrate using molecular beam epitaxy. The influence of different growth parameters such as InAs layer thickness, quantum barrier growth temperature, and number of stacking layers on the morphology and optical properties of dash structures were studied. The results serve as useful references for improved epitaxial...
We demonstrate a viable approach for ultrabroad-stimulated emission in InAs/InAlGaAs quantum-dash laser. This method involves the integration of multiple diodes with respective bandgaps tuned to different energies along a single laser cavity using postgrowth-intermixing process.
Due to the band anti-crossing effect by the high-lying nitrogen (N) resonant state, the InSbN alloys show markedly smaller energy band gap. This, together with their long Auger life, makes the alloys the best candidate for long wavelength infrared. We have fabricated a set of InSbN alloys by directly nitrogen implantation into the InSb substrate and characterize them with various facilities after...
We present the development of theoretical model based on multi-population rate equation to assess the derivative optical gain and chirp characteristics from the multiple states broadband InGaAs/GaAs quantum-dots laser. Our results show that the linewidth enhancement factor from the ground state is slightly larger but in the same order of magnitude as the values obtained in conventional quantum-dot...
A 9 watt AlGaAs/InGaAs/GaAs PHEMT MMIC power amplifier for Ku band applications is presented. This two-stage amplifier with chip size of 11.12 mm2 (4.52 mm times 2.46 mm) is designed to fully match 50 ohm input and output impedance. With 8 volts and 900 mA DC bias condition, 12 dB small signal gain, 39.5 dBm (9 Watt) saturated output power with 30% power-added efficiency from 14 to 14.2 GHz can be...
We demonstrate bandgap tuned InAs/InAlGaAs quantum-dash-in-well lasers grown on InP material using postgrowth quantum heterostructure intermixing. Compared to the control (non-intermixed) lasers, the light-current characteristics of lasers with emission wavelength tuned by over 100 nm shows insignificant changed suggesting that the quality of the intermixed material is well-preserved
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