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Atmospheric‐pressure (AP) linear cold plasma CVD is employed to deposit TiO2 photocatalytic films uniformly on a moving substrate. The in‐plane and in‐depth uniformities of the as‐deposited TiO2 films are investigated by scanning electron microscopy (SEM) and UV‐vis spectroscopy. The chemical binding states and compositions of the as‐deposited TiO2 films are characterized by X‐ray photoelectron spectroscopy...
Titanium dioxide (TiO2) films, because of their special properties, have been studied extensively as semiconductor photocatalyst for solar energy conversion and purification of water and air. Plasma CVD is highly efficient for depositing TiO2 films, but it has mainly been low pressure incorporated with sophisticated discharge and vacuum systems that have been adopted. Thus, in recent years, atmospheric-pressure...
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