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Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have...
Three-beam laser interference is used to create spot or grating patterns by three laser beams. In this paper, effect of parameters on three-beam laser interference is discussed. Computer simulation results have shown that the parameters and their deviations of incident angles, azimuthal angles and polarization states will affect the period, contrast, shape and direction of the spots of three-beam...
This paper presents various methods of multi-beam laser interference lithography to form dense periodical nanostructures suitable for many optical functional materials or devices. Research results show that 2D and 3D inference patterns could be generated cheaply and easily by exposing the photosensitive materials using the periodically changed light intensity distributions of multi-beam interference...
This paper introduces the quality inspection of nanoscale patterns produced by the Laser Interference Lithography (LIL) technology using image analysis techniques. In this paper, patterns of two-beam and four-beam interferences are considered. Image analysis techniques based on the Hough transform (HT) and Maximum Likelihood Estimation (MLE) have been applied to detect and estimate various quality...
Four-beam laser interference lithography (LIL) was shown to be a good technology to generate graded-index photonic crystals with a square lattice. Characters of the structure vary regularly with the incident angles and relative thresholds. The finite-difference time-domain method was used to validate the focusing behavior of the resultant structure. High intensity enhancement and sub-wavelength focusing...
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