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This letter reports a localized substrate removal (LSR) process for on-chip electrical isolation to promote the generation of high voltages by backside-illuminated complementary metal–oxide–semiconductor (CMOS) photovoltaic (PV) devices. The proposed four-cell-cascaded CMOS PV module provides an open-circuit voltage of 2.05 V, a short-circuit current of 2.6 mA, and a conversion efficiency of 11% under...
A robust design method applied to microgyroscope is presented which is of automation, efficiency and accuracy. The design target is to maximize the microgyroscope performance, within minimum variation of performance due to uncertainties caused by fabricating errors. Analysis of the tolerance is used to calculate the nominal value and the transmitted variation of the objective function, and the genetic...
This paper proposes a systematic error model for two type of structures of MEMS close-loop capacitive accelerometers, targeted to be used in micro inertial measurement unit (MIMU). The proposed model for the accelerometer's systematic errors includes common physical parameters used to rate an accelerometer: bias, scale factor, cross-axis sensitivity and misalignment. Dynamic analysis based on the...
This paper reports on a robust optimal design of MEMS gyroscope. Proposed robust design method uses perturbation method, which doesn't need to calculate derivative compared with method based on sensitivity analysis, considering the worst-case tolerance instead of statistical information about uncertainties. Monte Carlo analyses of robust and deterministic optimization are also studied, and results...
This paper reports on an efficient robust optimal design of MEMS gyroscope. Proposed method uses sensitivity analysis considering the worst-case tolerance instead of statistical information about uncertainties. The robust optimal models based on macromodels consider electro-mechanical couple-field analysis. Monte Carlo analysis and physical level verification are also studied.
Dimension uncertainty inevitably occurs in almost every fabrication of microstructure because of its small size and ununiformity of material, therefore, the dimension error is a significant factor to be considered in MEMS structure design. The unsymmetrical gaps of capacitors induced by processing are selected to analyze the effects of error on the pull-in voltage of capacitive microaccelerometer...
Dimension uncertainty inevitably occurs in almost every fabrication of micro structure because of its small size and ununiformity of material, therefore, the dimension error is a significant factor to be considered in MEMS structure design. The unsymmetrical gaps of capacitors induced by processing are selected to analyze the effects of error on the performance of accelerometer including its sensitivity...
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