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Mg2Si thin and ultra-thin films are grown on silicon (Si) substrates by performing heat treatments of Magnesium (Mg) layers deposited on Si (100), using radio frequency (RF)-sputtering and molecular beam epitaxy (MBE) techniques. In order to investigate the effect of annealing parameters on the formation of Mg2Si thin films, we conducted heat treatments under vacuum for some samples and in an argon...