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Abstract. The kinetics of the chemical growth of silicon oxide in H2O2-containing ammonia solutions and its break-up by dilute ammonia solutions was investigated using electrochemical techniques and more specifically electrochemical impedance spectroscopy. The recording of the open circuit potential (OCP), complemented by successive impedance diagrams, demonstrates clearly the build-up of a silicon...
Abstract The actual requirements for circuit miniaturization and production economy require obtaining smooth silicon surfaces using diluted chemicals, especially HF treatment. This fundamental research deals with the electrochemical corrosion of n- and p-type silicon substrates in 0.25M dilute HF solutions, and examines the influence of fluoride ions or protons additives. All experiments were conducted...
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