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Isopropyl alcohol (IPA) has been commonly used for drying wafers at a final step of cleaning process. As a result, the demand for higher purity IPA has been increasing, and the quality control of metallic impurities in IPA using the reliable analytical method is required. In this study, issues on the analysis of metallic impurities in IPA at ultra-trace level were investigated, and some accurate analysis...
In this paper, the ultrafine particle removal using gas cluster ion beam (GCIB) technology is investigated. The GCIB is irradiated the sample at an angle of 0 with respect to the surface normal. The higher particle removal efficiency can be achieved at the higher kinetic energy of the gas cluster, and the inside space of line and space pattern particles...
Quartz parts used in semiconductor equipment contains metal impurities that originate in manufacturing processes. Unfortunately, it is impossible to analyze all quartz parts for metallic contamination in order to determine the quantity of contamination because of destruction analysis. It has thus been considered difficult to control metallic contamination of quartz parts. In this study, to solve this...
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