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The optimization of parameters for laser deposition of nanoparticles on Si-wafer is studied. The threshold of laser energy, pulses per laser shot and overlapping is crucial in order to achieve the best deposition results.
Copper and Aluminum have similar reactions in Infra-red lasers for nano particle printing and different behavior in frequency doubled lasers. Absorption of two different metals shows various roughness of thin film on silicon wafer substrates.
In this research, different laser parameters is investigated using Nd:YAG Picosecond laser to sputter nano particles on Si-Wafer substrate. Furthermore, the influence of various parameters on adhesion tests and mechanism of deposited layer is studied.