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We investigate theoretically and experimentally transmission color filters using silicon subwavelength gratings on quartz substrates. Each grating area is 120 mum-square, which is suitable pixel size for displays and multichannel detectors. In the fabrication, electron beam lithography and fast atom beam etching are used. The grating periods are 400, 350, and 440 nm for the red, green, and blue filters,...
An absolute micro-encoder based on the code imaging is developed. The ball lens (phi300 mum) is assembled inside the cavity between the pyrex glass lid and suspensions in the handling Si layer of the SOI wafer. The photodiode array is prepared in the device Si layer. The image of the scale is incident on the backside of the photodiodes. The electrical wiring to photodiodes does not disturb the optics...
A mirror device for an external cavity diode laser is fabricated. To achieve a wide and continuous tuning range, mechanical linkage of two parallel rotation axes can rotate and translate the mirror, generating a virtual pivot point of the mirror motion. This mirror device is realized using a wafer-folding technique
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