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In this work we readdress the theoretical interpretation of the XMn(CO)5, X=Cl, Br, I photoelectron spectra by applying four-component Fock-space coupled cluster methods for their calculation. The final state characterization was based on group theoretical considerations of the contributing metal and ligand orbitals and the applied electronic structure methods extend earlier studies based on less...
In this study, a systematic experimental approach has been followed to determine the conditions to promote material removal rate while controlling surface defectivity for GaN CMP. Silica based slurries were used to optimize the CMP conditions for a commercial GaN sample as a function of pH, and type of polishing pad and conditioning. In addition, CMP responses of Face A and Face B type crystallographic...
The introduction of Ge/SiGe as a replacement material for silicon in the channel of advanced CMOS devices is a promising process option to enable the desired performance benefits/power reductions for future technology nodes (<10nm). Ge/SiGe CMP is an essential process step for the realization of the integration of these high mobility materials on standard Si wafers. Previously we have reported...
Germanium as a high electron mobility material (HEMM) is considered to replace silicon in FET devices. However, since a lot of technical challenges for pure germanium still need to be overcome, Silicon-Germanium alloys (SiGe) devices combine properties of Silicon and Germanium almost linear depending on their composition and are easier to integrate. For p-MOS integration schemes, SiGe has shown to...
III-V high mobility channel materials are being considered for advanced devices beyond the 10 nm technology node. For pMOS devices, Ge and SiGe have already been shown to be viable candidates [1,2] while for nMOS devices our focus lies on III-V materials such as InP and InGaAs. For the integration of III-V channel materials, several approaches are being explored: the aspect ratio trapping (ART) method...
5,6‐Benzo‐2‐methylene‐1,3‐dioxepane (BMDO) is used to obtain degradable polymeric nanoparticles via a statistical free‐radical copolymerization with MMA and styrene in direct miniemulsion. The nanoparticles are analyzed by means of IR, NMR, DLS, SEM, and TEM. They show excellent cellular uptake and drug delivery properties. The cellular uptake into HeLa cells of particles resulting from copolymerization...
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