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There are a number of emerging technologies such as metamaterials, photonic wave-guides, nano-imprint lithography (NIL), field emission devices and through silicon via (TSV), that require high resolution and high aspect ratio nanofabrication techniques for good performance. Unfortunately, current nanofabrication techniques, including photolithography and e-beam lithography, are limited to low aspect...
Superhydrophobic self-cleaning lotus effect surfaces are of interest for a variety of applications such as self-cleaning, water repellency and anticorrosion properties. Numerous approaches to generate superhydrophobic surfaces have been proposed. In these studies, high contact angles and reduced contact angle hysteresis were intensively investigated. In our study, we invoked a surface etching technique...
Creation of superhydrophobic self-cleaning surfaces is an important objective for a variety of applications. Indeed, numerous routes to generate superhydrophobic surfaces have been proposed. In this paper, a facile way of forming superhydrophobic surfaces is reported that uses Au assisted HF/H2O2 etching of silicon wafers. The Au layer was deposited onto a silicon wafer via e-Beam evaporation. By...
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