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In ULSI metallization with tantalum barriers the highest stress is generally induced in the barrier, because in the structure tantalum has the highest young modulus compared to the other materials. Regarding this barrier cracking can occur due to the high stress values. In this work possible approaches to simulate cracking appearances are selected from the literature and their feasibility will be...
In ULSI multilevel metallizations the via bottom is the main region for the appearance of local stress. This local stress can lead to fractures or porous spots. Out of this concerning the local stress distribution the via bottom region has to be investigated. Due to various technological processes the via shape especially the via bottom geometries are different. In this paper FE-Simulations with respect...
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