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The III -nitrides AIN, GaN, InN and their alloys are a novel family of semiconductor materials for optoelectronics as well as for electronics. GaN-based high electron mobility transistors (HEMTs) have shown superior power density and operating temperatures at frequency ranges that are beyond the limits of devices fabricated from Si and other III-V materials. This paper presents the advances in the...
In this paper, we present high performance 0.25mum gate-length self-aligned AIGaN/GaN HEMTs on 6H-SiC substrates using a single ohmic step. Our recently developed Mo/Al/Mo/Au-based ohmic contact requiring annealing temperatures between annealing temperatures 500 and 600degC was utilized. Ohmic contact resistances between 0.3 - 0.5 ohm-mm have been achieved.
A reliable low gate bias model extraction procedure for AlGaN/GaN is discussed. This method does not bias the device at a untenable high gate voltage in order to extract the parasitic inductance and resistance. The modeling procedure is reliable and simple with high accuracy up to 40GHz. The influence of extracted parasitic components is discussed
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