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Summary form only given. The stability and uniformity of a radio-frequency (RF) discharge is limited by a critical power density. Beyond this critical power density, instability occurs in the form of with physical changes in the plasma (such as contraction due to arcing). Levitsky identified and studied the two glow modes, alpha and gamma, of operation of an RF discharge. A detailed description of...
Summary form only given. In the semiconductor manufacturing industry, fluorocarbon-based plasmas are increasingly being replaced by NF3 plasmas for cleaning of CVD chambers. The clear advantages in doing so include faster clean times, reduced chamber damage and substantially lower emissions of gases having high global warming potentials (GWPs). Atomic fluorine (F), known for its ability to etch silicon-based...
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