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This paper reports a novel maskless nanoscale material etching method based on microplasma devices arrays. That is, inverted pyramidal microplasma devices arrays are integrated into the scanning probe tips array to realize maskless nanoscale material etching with advantages of high efficiency, large area and low cost. A 4×4 inverted pyramidal microplasma device array with each microcavity dimension...
This paper reports a novel maskless nanoscale material etching method based on microplasma reactor array with advantages of high etching efficiency, high fidelity, simple-structure, and flexible to etching various material. A 2×2 inverted pyramidal microplasma reactor array with each cavity dimension of 50µm was successfully fabricated by MEMS process. Experiment results showed that the devices could...
A “capacitive-piezo” transducer that separates a piezoelectric resonator from its electrodes via small gaps to eliminate resonator-to-electrode loss while maintaining strong electromechanical coupling, has enabled demonstration of a 50-MHz wine-glass disk (WGD) resonator array with Q=12,748. This is higher than exhibited by any sputtered thin-film AlN resonator measured to date at any frequency and...
Quality factors (Q's) greater than 10,000 and higher than reported for any other sputtered AlN d31-piezoelectric micromechanical resonator have been demonstrated for the first time using an energy sharing mechanical circuit that mechanically couples two electrode-equipped AlN resonators with several electrode-less ones. The key enablers behind the described Q increase are 1) removal of metal electrodes...
In this research, kaolin is used as the raw material and modified to prepare an inorganic ion-exchange material through different modification methods. In this paper, several surface feature evaluation methods (SEM, NMR, IR) are used to discuss and analyze the modification process of kaolin. According to CEC measurement, the obtained inorganic ion exchange material has an ammonium ion exchange capacity...
This paper presents a novel maskless microplasma etching method based on scanning probe microscopy. That is, an inverted pyramidal microdischarge is integrated into a hollow tip of a SiO2 cantilever probe, and the generated microplasmas are ejected through the nano -aperture to realize maskless etching with nano -resolution and high efficiency. The SiO2 cantilever with microdischarge and nano-aperture...
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