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We studied the process of deposition of a thin nanocrystalline ZnO layer on vertical free-standing GaP nanowires (NWs). The paper presents the preparation of a new type of composite antireflection coating based on a compact GaP NW/ZnO layer structure. The NWs were prepared using metal organic vapour phase epitaxy. They were grown at Au seeds created from a ∼0.3nm thick Au layer, which was deposited...
This contribution reports on properties and characterization of InAlN/GaN structures prepared by metal organic chemical vapour deposition (MOCVD) using secondary ion mass spectroscopy (SIMS). The SIMS revealed the vertical cross section of the InAlN/GaN sample structures on SiC substrate and also visualizes the different growth procedure results. The SIMS comparison of the structures shows the Al,...
Effects of photo-assisted electrodeless and ion RF-sputter etching on the structural and optical properties of sputtered ZnO:Al thin films were investigated. Photo-assisted electrodeless etching was appropriate for getting “smooth” surfaces and ion RF-sputter etching by high power has significantly modified the surface roughness with an increase of the light diffuse transmittance.
One of the methods for synthesis of intermetallic films consists of two steps: deposition of a multilayer film containing monometallic layers, and consequential annealing to induce a diffusion process and alloy formation. Though the diffusion coefficients are generally known for couples of common metals, they can considerably differ for films deposited by PVD due to their specific microstructure....
A p-type ZnO thin film was prepared by RF diode sputtering and nitrogen doping. Deposition in plasma N2 gas source increases the N solubility and thus the incorporation of No acceptor that is responsible for p-type conductivity of the ZnO films. Raman analyses performed in back scattering configuration proved the incorporation of the nitrogen acceptor No into ZnO:N. Raman spectra show E2 mode and...
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