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Polycrystalline WO 3 thin films were fabricated by reactive magnetron sputtering at a substrate temperature of 350 °C under different Ar/O 2 gas pressures. In order to study the thickness dependence of photoelectrochemical (PEC) behavior of WO 3 , the thickness-gradient films were fabricated and patterned using a micro-machined Si-shadow mask during the deposition process....